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Chemical vapour deposition : precursors, processes and applications
Autor: Anthony C. Jones, Michael L. Hitchman
ISBN: 9780854044658
OKCZID: 111332545
Citace (dle ČSN ISO 690):
JONES, Anthony C., ed. a HITCHMAN, Michael L., ed. Chemical vapour deposition: precursors, processes and applications. Cambridge: Royal Society of Chemistry, c2009. xv, 582 s.
Anotace
Written by leading experts in the field, this book gives a comprehensive overview of the various aspects of chemical vapour deposition processes and covers the basic concepts of types of CVD processes, the design of CVD reactors, reaction and reactor modelling, and the chemistry of CVD precursors and of deposition. There are detailed descriptions of the use of many CVD techniques to deposit a wide range of materials, including semiconductors, metals, metal oxides and nitrides, optical coatings, protective coatings and functional coatings on glass. Commercial aspects of CVD are also discussed, along with possible future trends. The book is aimed at CVD practitioners such as the chemist who wishes to learn more about CVD processes, or the CVD technologist wishing to gain an increased knowledge of precursor chemistry.
Zdroj anotace: OKCZ - ANOTACE Z WEBU