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Handbook of thin-film deposition processes and techniques :principles, methods, equipment and applications
Rok: 2002
ISBN: 9780815514428
OKCZID: 110186438
Vydání: 2nd ed.
Citace (dle ČSN ISO 690):
SESHAN, Krishna, ed. Handbook of thin-film deposition processes and techniques: principles, methods, equipment and applications. 2nd ed. Norwich: Noyes Publications, 2002. xxviii, 629 s.
Anotace
New second edition of the popular book on deposition (first edition by Klaus Schruegraf) for engineers, technicians, and plant personnel in the semiconductor and related industries. This book traces the technology behind the spectacular growth in the silicon semiconductor industry and the continued trend in miniaturization over the last 20 years. This growth has been fueled in large part by improved thin film deposition techniques and the development of highly specialized equipment to enable this deposition. The book includes much cutting-edge material. Entirely new chapters on contamination and contamination control describe the basics and the issuesùas feature sizes shrink to sub-micron dimensions, cleanliness and particle elimination has to keep pace. A new chapter on metrology explains the growth of sophisticated, automatic tools capable of measuring thickness and spacing of sub-micron dimensions. The book also covers PVD, laser and e-beam assisted deposition, MBE, and ion beam methods to bring together all the physical vapor deposition techniques.Two entirely new areas receive full treatment: chemical mechanical polishing which helps attain the flatness that is required by modern lithography methods, and new materials used for interconnect dielectric materials, specifically organic polyimide materials.